He Tian; Xuefeng Wang; Haiming Zhao; Wentian Mi; Yi Yang; Po‐Wen Chiu; Tian‐Ling Ren
文献索引:10.1002/aelm.201700608
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There is a growing trend of developing steep slope transistors with subthreshold swing (SS) below 60 mV dec−1. At present, there are mainly three kinds of steep slope transistors: tunneling transistor, negative capacitance transistor, and nano‐electromechanical relay. Here, a new kind of steep slope transistor named “filament transistor” is proposed with SS down to sub‐10 mV dec−1. Due to the gate E‐filed can penetrate through the graphene, the gate can effectively control the filament formation/rupture inside the 5 nm AlOx with very steep slope. In reverse sweep, the gate can induce the filament formation with SS down to 4.6 mV dec−1. In forward sweep, the gate can break the filament with SS down to 12.2 mV dec−1. Taking the advantages of nanofilament, the filament transistor holds a great potential to scaling down to 5 nm without performance changing.
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