Chemoselective Deprotection of Thioacetals/Thioketals Using HIO3 in the Presence of Wet SiO2 Under Mild Solvent-Free Conditions

MM Lakouraj, M Tajbakhsh, F Shirini…

文献索引：Lakouraj, Moslem M.; Tajbakhsh, Mahmood; Shirini, Farhad; Asady Tamami, Mohammad V. Phosphorus, Sulfur and Silicon and the Related Elements, 2005 , vol. 180, # 11 p. 2423 - 2429

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被引用次数: 3

摘要

HIO 3 in the presence of wet SiO 2 is highly efficient and a mild reagent for selective deprotection of a variety of thioacetals/thioketals to the corresponding parent carbonyl compounds at room temperature and under solvent-free conditions. ... HIO 3 in the presence of wet SiO 2 is highly efficient and a mild reagent for selective deprotection of a variety of thioacetals/thioketals to the corresponding parent carbonyl compounds at room temperature and under solvent-free ...