The critical pressures and the critical temperatures of ten tetraalkoxysilanes (tetraalkyl esters of silicic acid) Si [O (CH2) n H] 4 with n= 1 to 10 have been measured. All the substances studied begin to decompose at temperatures below their critical points. The method of pulse- heating applicable to thermally unstable compounds has been used. Residence times were from (0.03 to 1) ms, which resulted in little decomposition of the substances during ...
