Advanced Materials (FRG) 2012-12-18

Atomic layer engineering of perovskite oxides for chemically sharp heterointerfaces.

Woo Seok Choi, Christopher M Rouleau, Sung Seok A Seo, Zhenlin Luo, Hua Zhou, Timothy T Fister, Jeffrey A Eastman, Paul H Fuoss, Dillon D Fong, Jonathan Z Tischler, Gyula Eres, Matthew F Chisholm, Ho Nyung Lee

文献索引：Adv. Mater. 24(48) , 6423-8, (2012)

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摘要

Atomic layer engineering enables fabrication of a chemically sharp oxide heterointerface. The interface formation and strain evolution during the initial growth of LaAlO(3) /SrTiO(3) heterostructures by pulsed laser deposition are investigated in search of a means for controlling the atomic-sharpness of the interface. This study shows that inserting a monolayer of LaAlO(3) grown at high oxygen pressure dramatically enhances interface abruptness.Copyright © 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.