Advanced Materials (FRG) 2015-08-05

Directed Self-Assembly of Poly(2-vinylpyridine)-b-polystyrene-b-poly(2-vinylpyridine) Triblock Copolymer with Sub-15 nm Spacing Line Patterns Using a Nanoimprinted Photoresist Template.

Zhiwei Sun, Zhenbin Chen, Wenxu Zhang, Jaewon Choi, Caili Huang, Gajin Jeong, E Bryan Coughlin, Yautzong Hsu, XiaoMin Yang, Kim Y Lee, David S Kuo, Shuaigang Xiao, Thomas P Russell

文献索引：Adv. Mater. 27 , 4364-70, (2015)

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摘要

Low molecular weight P2VP-b-PS-b-P2VP triblock copolymer (poly(2-vinlypyridine)-block-polystyrene-block-poly(2-vinylpyridine)] is doped with copper chloride and microphase separated into lamellar line patterns with ultrahigh area density. Salt-doped P2VP-b-PS-b-P2VP triblock copolymer is self-assembled on the top of the nanoimprinted photoresist template, and metallic nanowires with long-range ordering are prepared with platinum-salt infiltration and plasma etching. © 2015 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.