Radical additions of bis (trimethylsilyl) phosphite to vinyltimethylsilane and vinyltriethoxysilane: Crystal structure of 2-trimethylsilylethane-phosphonic acid

AH Mahmoudkhani, V Langer…

Index: Mahmoudkhani, Amir H.; Langer, Vratislav; Lindqvist, Oliver Phosphorus, Sulfur and Silicon and the Related Elements, 2003 , vol. 178, # 10 p. 2159 - 2168

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Citation Number: 2

Abstract

Organosilicon-phosphonate compounds with the general formula (R) n (RO) 3 mn Si (CH 2) m P (O)(OSiR'3) 2 are designed for application as novel materials for surface treatments and modifications. A solvothermal method based on the reaction of bis (trimethylsilyl) phosphite with vinyltrimethylsilane and vinyltriethoxysilane in the presence of a peroxide in benzene solvent was used to synthesize the silyl-substituted esters of organosilicon-phosphonate ...