Abstract Several chlorofluoroalkanols R F-CH 2 OH (RF is CF 3-CFCl, CF 2 Cl-CF 2, CF 2 Cl- CFCl and CF 2 Cl) and their methacrylates or acrylates were synthesized. The corresponding polymeric methacrylates have properties of highly-sensitive electron-beam and X-ray resists for microlithograhy. The main step in the syntheses, which start from halogenoalkanes R F-CCl 3, is the chemo-selective reduction of halogenoesters with ...
