| Name | 3-oxabicyclo[3.3.1]nonane-2,4-dione | 
|---|---|
| Synonyms | cis-cyclohexane-1,3-dicarboxylic acid-anhydride cis-Cyclohexan-1,3-dicarbonsaeure-anhydrid 3-Oxabicyclo[3.3.1]nonane-2,4-dione, (1R,5S)- 1,3-cyclohexane dicarboxylic acid anhydride cyclohexane-1,3-dicarboxylic acid anhydride cis-1,3-Cyclohexanedicarboxylic anhydride Cyclohexan-1,3-dicarbonsaeure-anhydrid 3-Oxabicyclo[3.3.1]nonane-2,4-dione (1R,5S)-3-Oxabicyclo[3.3.1]nonane-2,4-dione 3-Oxabicyclo[3.3.1]nonane-2,4-dionato(5-) 3-oxabicyclo [3.3.1] nonane-2,4-dione cis-1,3-Cyclohexanedicarboxylic Anhydride | 
| Density | 1.236g/cm3 | 
|---|---|
| Boiling Point | 300.588°C at 760 mmHg | 
| Molecular Formula | C8H10O3 | 
| Molecular Weight | 154.163 | 
| Flash Point | 143.909°C | 
| Exact Mass | 154.062988 | 
| PSA | 43.37000 | 
| LogP | 0.07 | 
| Vapour Pressure | 0.0±0.6 mmHg at 25°C | 
| Index of Refraction | 1.502 | 
| HS Code | 2917209090 | 
|---|
| ~94%   4355-31-1 | 
| Literature: Barnett, Charles Jackson; Gu, Rui Lin; Kobierski, Michael Edward Patent: US2004/10005 A1, 2004 ; Location in patent: Page 18 ; | 
| ~%   4355-31-1 | 
| Literature: Dutta Journal of the Indian Chemical Society, 1940 , vol. 17, p. 613,617 Science and Culture, 1940 , vol. 5, p. 560 Chem.Abstr., 1940 , p. 6933 Full Text Show Details Komppa Annales Academiae Scientiarum Fennicae, Series A, 1932 , vol. 37, # 6 p. 7 | 
| ~%   4355-31-1 | 
| Literature: Komppa Annales Academiae Scientiarum Fennicae, Series A, 1932 , vol. 37, # 6 p. 7 | 
| ~%   4355-31-1 | 
| Literature: Komppa Annales Academiae Scientiarum Fennicae, Series A, 1932 , vol. 37, # 6 p. 7 | 
| ~91%   4355-31-1 | 
| Literature: ELI LILLY AND COMPANY [US/US] Patent: JP2004/509897 A, 2004 ; Location in patent: Page 45-46 ; | 
| ~0%   4355-31-1 | 
| Literature: Bonjouklian, Rosanne; Cohen, Jeffrey Daniel; Gruber, Joseph Michael; Johnson, Douglas Webb; Jungheim, Louis Nickolaus; Kroin, Julian Stanley; Lander, Peter Ambrose; Lin, Ho-Shen; Lohman, Mark Christopher; Muehl, Brian Stephen; Norman, Bryan Hurst; Patel, Vinod Francis; Richett, Michael Enrico; Thrasher, Kenneth Jeff; Vepachedu, Sreenivasarao; White, Wesley Todd; Xie, Yongping; York, Jeremy Schulenburg; Parkhurst, Brandon Lee Patent: US2003/100576 A1, 2003 ; US 20030100576 A1 | 
| HS Code | 2917209090 | 
|---|---|
| Summary | 2917209090 other cyclanic, cyclenic or cyclotherpenic polycarboxylic acids, their anhydrides, halides, peroxides, peroxyacids and their derivatives。supervision conditions:AB(certificate of inspection for goods inward,certificate of inspection for goods outward)。VAT:17.0%。tax rebate rate:9.0%。MFN tariff:6.5%。general tariff:30.0% |