Novel photolabile protecting group for carbonyl compounds
P Wang, H Hu, Y Wang
Index: Organic Letters, , vol. 9, # 8 p. 1533 - 1535
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Citation Number: 43
Abstract
... Volume: Page: ... Organic Letters. ... on well-established ortho-nitrobenzyl photochemistry have the inherent limitations of being sensitive to reactive organometallic reagents and reducing reagents, which restricts the scope of their application in organic synthesis. ...
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