Negative-Working Photosensitive Poly (phenylene ether) Based on Poly (2, 6-dimethyl-1, 4-phenylene ether), a Cross-Linker, and a Photoacid Generator
K Mizoguchi, T Higashihara, M Ueda
Index: Mizoguchi, Katsuhisa; Higashihara, Tomoya; Ueda, Mitsuru Macromolecules, 2010 , vol. 43, # 6 p. 2832 - 2839
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Citation Number: 4
Abstract
A novel benzyl cation type cross-linker, hex-1, 6-ylenebis [oxy (2, 4, 6-tris (acetyloxymethyl)- 3, 5-dimethylbenzene)](HOAD), that suppresses acid-catalyzed self-polycondensation has been developed. Furthermore, a negative-working, photosensitive poly (phenylene ether)(PSPPE) based on poly (2, 6-dimethyl-1, 4-phenylene ether)(PPE), HOAD, and diphenylidonium 9, 10-dimethoxyanthracene-2-sulfonate (DIAS) as a photoacid generator ...
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