Determination of porphyrin carbon isotopic composition using gas chromatography-isotope ratio monitoring mass spectrometry.
Z Yu, G Sheng, J Fu, P Peng
文献索引:J. Chromatogr. A. 903(1) , 183-191, (2000)
全文:HTML全文
摘要
Carbon isotopic compositions of aetio I occurring in the form of free-base, nickel, demetallation, dihydroxysilicon(IV) and bis(tert.-butyldimethylsiloxy)silicon(IV) [(tBDMSO)2Si(IV)] have shown that it has experienced no obvious isotope fractionation during the synthesis of [(tBDMSO)2Si(IV)] porphyrin from aetio I. Here, aetio I porphyrin species such as free-base, nickel, demetallated and dihydroxysilicon were analyzed by the conventional method, namely it is combusted in sealed system, and followed by isotope ratio monitoring mass spectrometric analysis. [(tBDMSO)2Si(IV)] aetio I was assayed by gas chromatography-isotope ratio monitoring mass spectrometry (GC-IRMS). A porphyrin mixture of [(tBDMSO)2Si(IV)] aetio I and octaethylporphyrin was also prepared. Their carbon isotopic compositions measured by GC-IRMS indicate that no isotope exchange took place between the porphyrins during the synthesis of [(tBDMSO)2Si(IV)] porphyrins. This method is employed for delta13C determination of geoporphyrins from the Maoming and Jianghan oil shales.
相关化合物
相关文献:
Chemical vapor deposition of silicon films using hexachlorodisilane Taylor, R. C., Scott, B. A., Lin, S. T., LeGoues, F., & Tsang, J. C.
[MRS Proceedings 77 , 709, (1986)]
Hexachlorodisilane as a Precursor in the LPCVD of Silicon Dioxide and Silicon Oxynitride Films. Taylor, R. C., & Scott, B. A.
[J. Electrochem. Soc. 136(8) , 2382-2386, (1989)]
Enhancing mechanical properties of silica aerogels Obrey, K. A., Wilson, K. V., & Loy, D. A.
[J. Non. Cryst. Solids 375(19) , 3435-3441, (2011)]
Use of hexachlorodisilane as a reducing agent. Stereospecific deoxygenation of acyclic phosphine oxides. Naumann K, et al.
[J. Am. Chem. Soc. 91(25) , 7012-7023, (1969)]
Film Properties of Low‐k Silicon Nitride Films Formed by Hexachlorodisilane and Ammonia. Tanaka M , et al.
[J. Electrochem. Soc. 147(6) , 2284-2289, (2000)]