三[N,N-双(三甲基硅烷)胺]钐(III)
三[N,N-双(三甲基硅烷)胺]钐(III)名称
[ CAS 号 ]:
35789-01-6
[ 中文名 ]:
三[N,N-二(三甲基甲硅烷基)酰胺]钐
[ 英文名 ]:
samarium tris(hexamethyldisilazide)
[英文别名 ]:
- samarium tris(hexamethylsilazide)
- TRIS[N,N-BIS(TRIMETHYLSILYL)AMIDE]SAMARIUM(III)
- MFCD03427097
- Tris[N,N-bis(trimethylsilyl)amide]samarium
三[N,N-双(三甲基硅烷)胺]钐(III)物理化学性质
[ 沸点 ]:
83-4ºC/1x10-4mmHg
[ 熔点 ]:
93-106ºC(lit.)
[ 分子式 ]:
C18H54N3Si6Sm
[ 分子量 ]:
631.51400
[ 闪点 ]:
36 °F
[ 精确质量 ]:
632.21300
[ PSA ]:
9.72000
[ LogP ]:
7.26750
[ 储存条件 ]:
2-8°C,密封,干燥,充气
三[N,N-双(三甲基硅烷)胺]钐(III)安全信息
[ 符号 ]:
GHS02, GHS05
[ 信号词 ]:
Danger
[ 危害声明 ]:
H228-H261-H314
[ 补充危害声明 ]:
Reacts violently with water.
[ 警示性声明 ]:
P210-P231 + P232-P280-P305 + P351 + P338-P310-P422
[ 个人防护装备 ]:
Eyeshields;Faceshields;full-face particle respirator type N100 (US);Gloves;respirator cartridge type N100 (US);type P1 (EN143) respirator filter;type P3 (EN 143) respirator cartridges
[ 危害码 (欧洲) ]:
F: Flammable;C: Corrosive;
[ 风险声明 (欧洲) ]:
R11
[ 安全声明 (欧洲) ]:
16-26-36/37/39-43-45-7/8
[ 危险品运输编码 ]:
UN 3396 4.3/PG 2
三[N,N-双(三甲基硅烷)胺]钐(III)文献
J. Colloid. Interface Sci. 356(1) , 298-302, (2011)
The surface free energy of a solid determines its surface and interfacial behavior in processes like wetting and adhesion which is crucial for silica aerogels in case of organic liquid absorption and ...
A facile two-step dipping process based on two silica systems for a superhydrophobic surface.Chem. Commun. (Camb.) 47(38) , 10761-3, (2011)
A silica microsphere suspension and a silica sol are employed in a two-step dipping process for the preparation of a superhydrophobic surface. It's not only a facile way to achieve the lotus effect, b...
Trimethylsilylation of cellulose in ionic liquids.Macromol. Biosci. 9(4) , 369-75, (2009)
Trimethylsilylation of cellulose in different 1,3-dialkylimidazolium ionic liquids (IL) with hexamethyldisilazane (HMDS) as a silylating agent was investigated. Trimethylsilyl (TMSi) cellulose with a ...
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标题:35789-01-6_三[N,N-双(三甲基硅烷)胺]钐(III)CAS号:35789-01-6_三[N,N-双(三甲基硅烷)胺]钐(III)【结构式 性质 英文】 - 化源网 地址:https://m.chemsrc.com/mip/cas/35789-01-6_1189599.html