ACS applied materials & interfaces

Novel one-component positive-tone chemically amplified i-line molecular glass photoresists

J Yu, N Xu, Z Liu, L Wang

文献索引：Baumbach, B.; Bendig, J.; Nagel, T.; Dubsky, B. Journal fuer Praktische Chemie (Leipzig), 1991 , vol. 333, # 4 p. 625 - 635

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被引用次数: 18

摘要

... Select a Journal or Book ... an exposure dose of 55 mJ/cm 2 . No obvious deformation was observed for the pattern with post exposure bake (PEB) at 100 o C for 60 s. The cross-section SEM of the i-line lithographic patterns is also presented (Figure 6b) in which T-topping is ...