The photolysis of benzylic sulfonyl compounds (XSO2CH2Ph) gives products which are explained in terms of the chemistry of the benzyl and sulfonyl (XSO2) radicals. The synthetic applications of this photocleavage have been examined for two general cases:(i) preparation of sulfones from disulfone precursors, R1SO2CHR2SO2CH2Ph to R1SO2CH2R2 (yields~ 90%);(ii) preparation of sulfinic acids and sulfonyl chlorides from ...
[Abdel-Wahab, Aboel-Magd A.; El-Khawaga, Ahmed M.; El-Zohry, Maher F.; Khalaf, Ali A. Phosphorus and Sulfur and the Related Elements, 1984 , vol. 19, p. 31 - 44]