Controlled Photochemical Release of Nitric Oxide from O 2-Benzyl-Substituted Diazeniumdiolates

PH Ruane, KM Bushan, CM Pavlos…

Index: Ruane, Patrick H.; Bushan, K. Mani; Pavlos, Christopher M.; D'Sa, Raechelle A.; Toscano, John P. Journal of the American Chemical Society, 2002 , vol. 124, # 33 p. 9806 - 9811

Full Text: HTML

Citation Number: 30

Abstract

An investigation of potential photosensitive protecting groups for diazeniumdiolates (R2N N (O) NO-) has been initiated, and here the effect of meta electron-donating groups on the photochemistry of O 2-benzyl-substituted diazeniumdiolates (R2N N (O) NOCH2Ar) is reported. Photolysis of the parent benzyl derivative (Ar= Ph) results almost exclusively in undesired photochemistry the formation of nitrosamine and an oxynitrene intermediate ...