- Shanghai Jizhi Biochemical Technology Co., Ltd
- China
- Product Name: 2-Methyl-1-naphthaleneboronic acid
- Price: ￥3928.0/1g ￥1548.0/250mg
- Purity: 98.0%
- Stocking Period: 3 Day
- Contact: Liu jia
- Dayang Chem (Hangzhou) Co., Ltd.
- China
- Product Name: 2-Methyl-1-naphthalene boronic acid
- Price: $Inquiry/100g $Inquiry/1kg $Inquiry/100kg $Inquiry/1000kg
- Purity: 98.0%
- Stocking Period: Inquiry
- Contact: Ms Wang
103989-84-0
103989-84-0 structure
- Name: 2-Methyl-1-naphthaleneboronic acid
- Chemical Name: (2-methylnaphthalen-1-yl)boronic acid
- CAS Number: 103989-84-0
- Molecular Formula: C11H11BO2
- Molecular Weight: 186.01500
- Create Date: 2018-06-16 16:41:36
- Modify Date: 2024-01-10 16:56:08
| Name | (2-methylnaphthalen-1-yl)boronic acid |
|---|---|
| Synonyms |
2-methylnaphthalen-1-ylboronic acid
2-methyl-1-naphthaleneboronic acid 2-methyl-1-naphthalenylboronic acid 2-methyl-1-naphthylboronic acid |
| Density | 1.18g/cm3 |
|---|---|
| Boiling Point | 393.8ºC at 760 mmHg |
| Melting Point | 126 ºC |
| Molecular Formula | C11H11BO2 |
| Molecular Weight | 186.01500 |
| Flash Point | 192ºC |
| Exact Mass | 186.08500 |
| PSA | 40.46000 |
| LogP | 0.82800 |
| Vapour Pressure | 6.59E-07mmHg at 25°C |
| Index of Refraction | 1.623 |
| Storage condition | 2-8°C |
| Water Solubility | Very slightly soluble (0.18 g/L) (25 ºC) |
|
~86%
103989-84-0 |
| Literature: De Koning, Charles B.; Michael, Joseph P.; Nhlapo, Johanna M.; Pathak, Rakhi; Van Otterlo, Willem A. L. Synlett, 2003 , # 5 p. 705 - 707 |
|
~%
103989-84-0 |
| Literature: Malkov, Andrei V.; Ramirez-Lopez, Pedro; Biedermannova, Lada; Rulisek, Lubomir; Dufkova, Lenka; Kotora, Martin; Zhu, Fujiang; Kocovsky, Pavel Journal of the American Chemical Society, 2008 , vol. 130, # 15 p. 5341 - 5348 |
|
~%
103989-84-0 |
| Literature: Wang, Wei-Bo; Curtin, Michael L.; Fakhoury, Stephen A.; Gwaltney II, Stephen L.; Hasvold, Lisa A.; Hutchins, Charles W.; Li, Qun; Lin, Nan-Horng; Nelson, Lissa Taka Jennings; O'Connor, Steve; Sham, Hing L.; Sullivan, Gerard M.; Wang, Gary T.; Wang, Xilu Patent: US2002/19527 A1, 2002 ; |
|
~%
103989-84-0 |
| Literature: Pathak, Rakhi; Nhlapo, Johanna M.; Govender, Sameshnee; Michael, Joseph P.; Van Otterlo, Willem A. L.; De Koning, Charles B. Tetrahedron, 2006 , vol. 62, # 12 p. 2820 - 2830 |
|
~%
103989-84-0 |
| Literature: Clews, John; Curtis, Anthony D.M.; Malkin, Hugh Tetrahedron, 2000 , vol. 56, # 44 p. 8735 - 8746 |
| Precursor 5 | |
|---|---|
| DownStream 6 | |
![(±)-[5]helicene structure](https://www.chemsrc.com/caspic/399/188-52-3.png)
