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409-21-2

409-21-2 structure
409-21-2 structure

Name silicon carbide
Synonyms Silicon cbide, ^a
CBORUNDUM BOILING CHIPS 20 MESH
Cborndum
SILICON CBIDE, NANOPOWDER
SILICONCBIDLATELETS
Siliconcbidemesh
Siliconcbide,-100mesh
Cborundumpowderfine
SiC
Silicon cbide, ^a-phase
Silicon cbide ,cloth(SiC)
cborun
SILICONCBIDEWHISKER
Silicon cbide, alpha-phase
EINECS 206-991-8
Silicon cbide, ^b-phase
SILICONCBIDEFIBRE
CBORUNDUM BOILING CHIPS, 20 MESHCBORUNDUM BOILING CHIPS, 20 MESHCBORUNDUM BOILING CHIPS, 20 MESHCBORUNDUM BOILING CHIPS, 20 MESH
MFCD00049531
silicon cbide, needles
Silicon Carbide
Cborundumpowdercoseit
silicon cbide, inding compound, 2oz
Silicon cbide powder, cose, 46 it
Silicon cbide, α-phase, trace
SILICIUMCBIDE
ua1
ua3
Cborundumpowdermediumit
ua2
CBORUNDUM BOILING CHIPS 4 MESH
ua4
silicon ebide fibre
Silicon cbide powder, fine, it
silicon calbide
Silicon cbide powder, medium, it
kz5m
SIC UF-25 SILICON CBIDE ADE UF-25 - A PRODUCT OF H.C. STCK
Silicon cbide,micropowder
uf15
SILICON CBIDE, -400 MESH
SIC BF-12 SILICON CBIDE ADE BF-12 - A PRODUCT OF H.C. STCK
Cborundumpowdersuperfineit
CBORUNDUM BOILING CHIPS, 14 MESHCBORUNDUM BOILING CHIPS, 14 MESHCBORUNDUM BOILING CHIPS, 14 MESHCBORUNDUM BOILING CHIPS, 14 MESH
CBORUNDUM BOILING CHIPS 8 MESH
Silicon cbide powder, superfine, it
Cborundum powder, medium, it
Silicon cbide, beta-phase
Silicon cbide, trace
Cborundum powder, superfine, it
scw1
BLACK SILICON CBIDE
CBORUNDUM BOILING CHIPS, 4 MESHCBORUNDUM BOILING CHIPS, 4 MESHCBORUNDUM BOILING CHIPS, 4 MESHCBORUNDUM BOILING CHIPS, 4 MESH
SIC UF-15 PREMIX COSE SILICON CBIDE ADE UF-15 PREMIX COSE - A PRODUCT OF H.C. STCK
ANULSILICONCBIDE
TWS-100
Silicon cbide wafer
Cborundum powder, cose, 46 it
SILICON CBIDE
kz7m
SILICON CBIDE, MESH
Silicon cbide -400 Mesh pticle size, >=
medium,it
Silicon cbide, ^b-phase, min
Silicon cbide whiskers, trace
CBORUNDUM BOILING CHIPS, 8 MESHCBORUNDUM BOILING CHIPS, 8 MESHCBORUNDUM BOILING CHIPS, 8 MESHCBORUNDUM BOILING CHIPS, 8 MESH
kz3m
CBORUNDUM BOILING CHIPS 14 MESH
CBORUNDUM (SILICON CBIDE )
Density 3.22
Melting Point 2700ºC
Molecular Formula CSi
Molecular Weight 40.096
Exact Mass 39.976925
Index of Refraction 2.65
Stability Stability
Water Solubility Soluble in molten sodium hydroxide, potassium hydroxide and in molten iron. | Soluble in molten alkalis (NaOH, KOH) and molten iron. Insoluble in water.

CHEMICAL IDENTIFICATION

RTECS NUMBER :
VW0450000
CHEMICAL NAME :
Silicon carbide
CAS REGISTRY NUMBER :
409-21-2
LAST UPDATED :
199712
DATA ITEMS CITED :
30
MOLECULAR FORMULA :
C-Si
MOLECULAR WEIGHT :
40.10
WISWESSER LINE NOTATION :
.SI..C

HEALTH HAZARD DATA

ACUTE TOXICITY DATA

TYPE OF TEST :
TCLo - Lowest published toxic concentration
ROUTE OF EXPOSURE :
Inhalation
SPECIES OBSERVED :
Rodent - rat
DOSE/DURATION :
60 mg/m3/6H/13W-I
TOXIC EFFECTS :
Lungs, Thorax, or Respiration - changes in lung weight
REFERENCE :
FAATDF Fundamental and Applied Toxicology. (Academic Press, Inc., 1 E. First St., Duluth, MN 55802) V.1- 1981- Volume(issue)/page/year: 16,128,1991 ** TUMORIGENIC DATA **
TYPE OF TEST :
TDLo - Lowest published toxic dose
ROUTE OF EXPOSURE :
Intraperitoneal
SPECIES OBSERVED :
Rodent - rat
DOSE/DURATION :
300 mg/kg/26W-I
TOXIC EFFECTS :
Tumorigenic - equivocal tumorigenic agent by RTECS criteria Gastrointestinal - tumors
REFERENCE :
EKSODD Eksperimental'naya Onkologiya. Experimental Oncology. (V/O Mezhdunarodnaya Kniga, 113095 Mosow, USSR) V.1- 1979- Volume(issue)/page/year: 11(2),13,1989
TYPE OF TEST :
TDLo - Lowest published toxic dose
ROUTE OF EXPOSURE :
Implant
SPECIES OBSERVED :
Rodent - rat
DOSE/DURATION :
200 mg/kg
REFERENCE :
JJIND8 JNCI, Journal of the National Cancer Institute. (Washington, DC) V.61-79, 1978-87. For publisher information, see JNCIEQ. Volume(issue)/page/year: 67,965,1981 *** REVIEWS *** ACGIH TLV-Not classifiable as a human carcinogen DTLVS* The Threshold Limit Values (TLVs) and Biological Exposure Indices (BEIs) booklet issues by American Conference of Governmental Industrial Hygienists (ACGIH), Cincinnati, OH, 1996 Volume(issue)/page/year: TLV/BEI,1997 ACGIH TLV-TWA 10 mg/m3, total dust DTLVS* The Threshold Limit Values (TLVs) and Biological Exposure Indices (BEIs) booklet issues by American Conference of Governmental Industrial Hygienists (ACGIH), Cincinnati, OH, 1996 Volume(issue)/page/year: TLV/BEI,1997 *** U.S. STANDARDS AND REGULATIONS *** MSHA STANDARD:NUISANCE PARTICULATES DTLWS* "Documentation of the Threshold Limit Values for Substances in Workroom Air," Supplements. For publisher information, see 85INA8. Volume(issue)/page/year: 3,28,1973 OSHA PEL (Gen Indu):8H TWA 15 mg/m3, total dust CFRGBR Code of Federal Regulations. (U.S. Government Printing Office, Supt. of Documents, Washington, DC 20402) Volume(issue)/page/year: 29,1910.1000,1994 OSHA PEL (Gen Indu):8H TWA 5 mg/m3, respirable fraction CFRGBR Code of Federal Regulations. (U.S. Government Printing Office, Supt. of Documents, Washington, DC 20402) Volume(issue)/page/year: 29,1910.1000,1994 OSHA PEL (Construc):8H TWA 15 mg/m3, total dust CFRGBR Code of Federal Regulations. (U.S. Government Printing Office, Supt. of Documents, Washington, DC 20402) Volume(issue)/page/year: 29,1926.55,1994 OSHA PEL (Construc):8H TWA 5 mg/m3, respirable fraction CFRGBR Code of Federal Regulations. (U.S. Government Printing Office, Supt. of Documents, Washington, DC 20402) Volume(issue)/page/year: 29,1926.55,1994 OSHA PEL (Shipyard):8H TWA 15 mg/m3, total dust CFRGBR Code of Federal Regulations. (U.S. Government Printing Office, Supt. of Documents, Washington, DC 20402) Volume(issue)/page/year: 29,1915.1000,1993 OSHA PEL (Shipyard):8H TWA 5 mg/m3, respirable fraction CFRGBR Code of Federal Regulations. (U.S. Government Printing Office, Supt. of Documents, Washington, DC 20402) Volume(issue)/page/year: 29,1915.1000,1993 *** OCCUPATIONAL EXPOSURE LIMITS *** OEL-AUSTRALIA:TWA 10 mg/m3 JAN 1993 OEL-BELGIUM:TWA 10 mg/m3 JAN 1993 OEL-FRANCE:TWA 10 mg/m3 JAN 1993 OEL-GERMANY:TWA 4 mg/m3 JAN 1993 OEL-THE NETHERLANDS:TWA 10 mg/m3 JAN 1993 OEL-SWITZERLAND:TWA 4 mg/m3 JAN 1993 OEL-UNITED KINGDOM:TWA 10 mg/m3 (total dust) JAN 1993 OEL-UNITED KINGDOM:TWA 5 mg/m3 (resp. dust) JAN 1993 OEL IN BULGARIA, COLOMBIA, JORDAN, KOREA check ACGIH TLV OEL IN NEW ZEALAND, SINGAPORE, VIETNAM check ACGIH TLV *** NIOSH STANDARDS DEVELOPMENT AND SURVEILLANCE DATA *** NIOSH RECOMMENDED EXPOSURE LEVEL (REL) : NIOSH REL TO SILICON CARBIDE, resp. fraction-air:10H TWA 5 mg/m3 REFERENCE : NIOSH* National Institute for Occupational Safety and Health, U.S. Dept. of Health, Education, and Welfare, Reports and Memoranda. Volume(issue)/page/year: DHHS #92-100,1992 NIOSH RECOMMENDED EXPOSURE LEVEL (REL) : NIOSH REL TO SILICON CARBIDE, total dust-air:10H TWA 10 mg/m3 REFERENCE : NIOSH* National Institute for Occupational Safety and Health, U.S. Dept. of Health, Education, and Welfare, Reports and Memoranda. Volume(issue)/page/year: DHHS #92-100,1992 NIOSH OCCUPATIONAL EXPOSURE SURVEY DATA : NOHS - National Occupational Hazard Survey (1974) NOHS Hazard Code - 17525 No. of Facilities: 25235 (estimated) No. of Industries: 184 No. of Occupations: 97 No. of Employees: 268082 (estimated) NOES - National Occupational Exposure Survey (1983) NOES Hazard Code - X4228 No. of Facilities: 158 (estimated) No. of Industries: 4 No. of Occupations: 12 No. of Employees: 8693 (estimated) No. of Female Employees: 84 (estimated) NOES - National Occupational Exposure Survey (1983) NOES Hazard Code - X6494 No. of Facilities: 1250 (estimated) No. of Industries: 25 No. of Occupations: 22 No. of Employees: 17481 (estimated) No. of Female Employees: 1482 (estimated) NOES - National Occupational Exposure Survey (1983) NOES Hazard Code - 17525 No. of Facilities: 13729 (estimated) No. of Industries: 129 No. of Occupations: 97 No. of Employees: 250945 (estimated) No. of Female Employees: 19568 (estimated)
Personal Protective Equipment dust mask type N95 (US);Eyeshields;Gloves
Hazard Codes Xi:Irritant;
Risk Phrases R36/37/38
Safety Phrases S26-S36
RIDADR NONH for all modes of transport
WGK Germany 3
RTECS VW0450000
HS Code 2849200000
HS Code 2849200000
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