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17176-77-1

17176-77-1 structure
17176-77-1 structure

Name Dibenzyl phosphite
Synonyms EINECS 241-226-1
dibenzylphosphite
Phosphorous Acid Dibenzyl Ester
O,O'-DIBENZYLPHOSPHINE
Phosphonic Acid Dibenzyl Ester
Dipenzylphosphit
DIBENZYL PHOSPHITE,TECH.
Dibenzyl Phosphite
DIBENZYL PHOSPHONATE
MFCD00004774
Density 1.187 g/mL at 25 °C(lit.)
Boiling Point 110-120 °C0.01 mm Hg(lit.)
Melting Point 17ºC
Molecular Formula C14H15O3P
Molecular Weight 262.24100
Flash Point >230 °F
Exact Mass 262.07600
PSA 59.00000
LogP 3.80970
Vapour Pressure 0mmHg at 25°C
Index of Refraction n20/D 1.555(lit.)
Storage condition 2-8°C
Personal Protective Equipment Eyeshields;Gloves
Hazard Codes Xi:Irritant;
Risk Phrases R36/37/38
Safety Phrases S37/39-S26-S36
RIDADR UN3278
WGK Germany 3
Packaging Group III
Hazard Class 6.1
HS Code 2920909090

~95%

17176-77-1 structure

17176-77-1

Literature: Perruchon, Johann; Ortmann, Regina; Schlitzer, Martin Synthesis, 2007 , # 22 p. 3553 - 3557

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17176-77-1 structure

17176-77-1

Literature: Fisher, Henry C.; Prost, Lucie; Montchamp, Jean-Luc European Journal of Organic Chemistry, 2013 , # 35 p. 7973 - 7978

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17176-77-1 structure

17176-77-1

Literature: Journal of the Chemical Society, , p. 677 Journal of the Chemical Society, , p. 382,384 Biochemical Preparations, , vol. 5, p. 1,2

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17176-77-1 structure

17176-77-1

Literature: Journal of the Chemical Society, , p. 815,819

~80%

17176-77-1 structure

17176-77-1

Literature: Arimilli, Murty N.; Becker, Mark M.; Birkus, Gabriel; Bryant, Clifford; Chen, James M.; Chen, Xiaowu; Cihlar, Tomas; Dastgah, Azar; Eisenberg, Eugene J.; Fardis, Maria; Hatada, Marcos; He, Gong-Xin; Jin, Haolun; Kim, Choung U.; Lee, William A.; Lee, Christopher P.; Lin, Kuei-Ying; Liu, Hongtao; MacKman, Richard L.; McDermott, Martin J.; Mitchell, Michael L.; Nelson, Peter H.; Pyun, Hyung-Jung; Rowe, Tanisha D.; Sparacino, Mark; Swaminathan, Sundaramoorthi; Tario, James D.; Wang, Jianying; Williams, Matthew A.; Xu, Lianhong; Yang, Zheng-Yu; Yu, Richard H.; Zhang, Jiancun; Zhang, Lijun Patent: US2005/239054 A1, 2005 ;

~51%

17176-77-1 structure

17176-77-1

Literature: Arimilli, Murty N.; Becker, Mark M.; Birkus, Gabriel; Bryant, Clifford; Chen, James M.; Chen, Xiaowu; Cihlar, Tomas; Dastgah, Azar; Eisenberg, Eugene J.; Fardis, Maria; Hatada, Marcos; He, Gong-Xin; Jin, Haolun; Kim, Choung U.; Lee, William A.; Lee, Christopher P.; Lin, Kuei-Ying; Liu, Hongtao; MacKman, Richard L.; McDermott, Martin J.; Mitchell, Michael L.; Nelson, Peter H.; Pyun, Hyung-Jung; Rowe, Tanisha D.; Sparacino, Mark; Swaminathan, Sundaramoorthi; Tario, James D.; Wang, Jianying; Williams, Matthew A.; Xu, Lianhong; Yang, Zheng-Yu; Yu, Richard H.; Zhang, Jiancun; Zhang, Lijun Patent: US2005/239054 A1, 2005 ;

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17176-77-1 structure

17176-77-1

Literature: Journal of the Chemical Society, , p. 1106,1111
HS Code 2920909090
Summary 2920909090 esters of other inorganic acids of non-metals (excluding esters of hydrogen halides) and their salts; their halogenated, sulphonated, nitrated or nitrosated derivatives。Supervision conditions:None。VAT:17.0%。Tax rebate rate:9.0%。MFN tariff:6.5%。General tariff:30.0%