Dioxoruthenium structure
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Common Name | Dioxoruthenium | ||
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CAS Number | 12036-10-1 | Molecular Weight | 133.069 | |
Density | 6.97 | Boiling Point | N/A | |
Molecular Formula | O2Ru | Melting Point | 1200ºC (subl.) | |
MSDS | Chinese USA | Flash Point | N/A | |
Symbol |
GHS07 |
Signal Word | Warning |
Name | Ruthenium(IV) oxide |
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Synonym | More Synonyms |
Density | 6.97 |
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Melting Point | 1200ºC (subl.) |
Molecular Formula | O2Ru |
Molecular Weight | 133.069 |
Exact Mass | 133.894211 |
PSA | 34.14000 |
Water Solubility | insoluble |
CHEMICAL IDENTIFICATION
HEALTH HAZARD DATAACUTE TOXICITY DATA
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Symbol |
GHS07 |
---|---|
Signal Word | Warning |
Hazard Statements | H319 |
Precautionary Statements | P305 + P351 + P338 |
Personal Protective Equipment | dust mask type N95 (US);Eyeshields;Gloves |
Hazard Codes | Xi:Irritant; |
Risk Phrases | R36 |
Safety Phrases | S26-S39 |
RIDADR | NONH for all modes of transport |
WGK Germany | 2 |
RTECS | VM2654000 |
Packaging Group | I; II; III |
Hazard Class | 5.1 |
HS Code | 2843900090 |
HS Code | 2843900090 |
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Amplified detection of microRNA based on ruthenium oxide nanoparticle-initiated deposition of an insulating film.
Anal. Chem. 83(3) , 820-7, (2011) A highly sensitive microRNA (miRNA) biosensor that employs ruthenium oxide nanoparticle (RuO(2) NP)-initiated polymerization of 3,3'-dimethoxybenzidine (DB) and miRNA-templated deposition of an insula... |
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Adlayer inhomogeneity without lateral interactions: rationalizing correlation effects in CO oxidation at RuO2(110) with first-principles kinetic Monte Carlo.
J. Chem. Phys. 134(6) , 064713, (2011) Microkinetic modeling of surface chemical reactions still relies heavily on the mean-field based rate equation approach. This approach is expected to be most accurate for systems without appreciable l... |
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Effects of postannealing process on the properties of RuO2 films and their performance as electrodes in organic thin film transistors or solar cells.
ACS Appl. Mater. Interfaces 4(9) , 4588-94, (2012) RuO(2) films were deposited on SiO(2) (300 nm)/N++Si substrates using radio frequency magnetron sputtering at room temperature. As-deposited RuO(2) films were annealed at different temperatures (100, ... |
ruthenium(iv) oxide |
EINECS 234-840-6 |
MFCD00011210 |
Dioxoruthenium |
Ruthenium, dioxo- |
ruthenium dioxide |