2-(Phenylsulfanyl)-1H-isoindole-1,3(2H)-dione

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Names

[ CAS No. ]:
14204-27-4

[ Name ]:
2-(Phenylsulfanyl)-1H-isoindole-1,3(2H)-dione

[Synonym ]:
2-PHENYLSULFANYL-ISOINDOLE-1,3-DIONE
2-(Phenylsulfanyl)-1H-isoindole-1,3(2H)-dione
1H-Isoindole-1,3(2H)-dione, 2-(phenylthio)-
2-phenylsulfanylisoindole-1,3-dione
N-(Phenylthio)phthalimide

Chemical & Physical Properties

[ Density]:
1.4±0.1 g/cm3

[ Boiling Point ]:
432.2±28.0 °C at 760 mmHg

[ Melting Point ]:
160-163ºC(lit.)

[ Molecular Formula ]:
C14H9NO2S

[ Molecular Weight ]:
255.292

[ Flash Point ]:
215.2±24.0 °C

[ Exact Mass ]:
255.035400

[ PSA ]:
62.68000

[ LogP ]:
3.33

[ Vapour Pressure ]:
0.0±1.0 mmHg at 25°C

[ Index of Refraction ]:
1.723

MSDS

Click to get detail MSDS

Safety Information

[ RIDADR ]:
NONH for all modes of transport

[ WGK Germany ]:
3

[ HS Code ]:
2930909090

Synthetic Route

Click to get detail synthetic route

Precursor & DownStream

Precursor

  • Thiophenol
  • (Chlorosulfanyl)benzene
  • Diphenyl disulfide
  • Phenyl phenylthio sulfone
  • 4-Chlorobenzenesulfonothioic acid S-phenyl ester
  • 1-methoxy-4-phenylsulfanylsulfonylbenzene

DownStream

  • ethyl 3-phenylsulfanyl-1H-indole-2-carboxylate
  • Mesityl phenyl sulfide
  • Ethyl benzoate
  • (butyldisulfanyl)benzene
  • Diphenylsulfid
  • T56 BVNVJ C1
  • dimethoxyphosphorylsulfanylbenzene
  • (tert-butyldisulfanyl)benzene
  • Methyl benzenesulfinate

Customs

[ HS Code ]: 2930909090

[ Summary ]:
2930909090. other organo-sulphur compounds. VAT:17.0%. Tax rebate rate:13.0%. . MFN tariff:6.5%. General tariff:30.0%

Articles

Catalytic asymmetric sulfenylation of unprotected 3-substituted oxindoles.

Org. Lett. 14(11) , 2726-9, (2012)

Catalytic asymmetric sulfenylation of unprotected 3-substituted oxindoles has been developed via cooperative catalysis of a chiral N,N'-dioxide-Sc(OTf)(3) complex and a Brønsted base. Utilizing readil...

Formation, characterization, and sub-50-nm patterning of organosilane monolayers with embedded disulfide bonds: An engineered self-assembled monolayer resist for electron-beam lithography. Wang X, et al.

Langmuir 19(23) , 9748-9758, (2003)

On the involvement of lipoic acid in. alpha.-keto acid dehydrogenase complexes. Rastetter WH, et al.

J. Am. Chem. Soc. 101(10) , 2752-2753, (1979)


More Articles

Related Compounds

  • 2-Isopropyl-1H-isoindole-1,3(2H)-dione
  • 2-(Allyloxy)-1H-isoindole-1,3(2H)-dione
  • 2-(Chloromethyl)-1H-isoindole-1,3(2H)-dione
  • 2-(Cyclopropylmethoxy)-1H-isoindole-1,3(2H)-dione
  • 2-Bromo-1H-isoindole-1,3(2H)-dione
  • 2-(cyclohexyloxy)-1H-isoindole-1,3(2H)-dione
  • 4-((Cyclohexylamino)methyl)benzoic acid hydrochloride
  • 1-[(2,4-Dichlorophenyl)methyl]-N-(1,1-dimethylethyl)-2-methyl-1H-indole-3-methanamine
  • 1,6-Naphthyridine, 2-(2-methylphenyl)-
  • 2-Propyl-7-(trifluoromethyl)-[1,2,4]triazolo[1,5-a]pyridin-5-ol
  • 2-Methoxy-6-(pyrazol-1-yl)-benzonitrile
  • 1H-3-Benzazepin-7-ol, 8-chloro-2,3,4,5-tetrahydro-5-(3-iodophenyl)-3-methyl-, (S)-
  • 2-(Dimethyl-1,2-oxazol-4-yl)-2,2-difluoroethan-1-ol
  • 3-(3-Chloro-4-nitrophenyl)prop-2-enal
  • 3,3-Difluoro-4,4-dimethoxybutan-1-amine
  • (4-Methyl-tetrahydro-furan-2-yl)-methanol