Tetrakis(dimethylamido)hafnium

Names

[ CAS No. ]:
19782-68-4

[ Name ]:
Tetrakis(dimethylamido)hafnium

[Synonym ]:
MFCD01862473

Chemical & Physical Properties

[ Density]:
1.098 g/mL at 25 °C

[ Boiling Point ]:
6.1ºC at 760 mmHg

[ Melting Point ]:
26-29ºC(lit.)

[ Molecular Formula ]:
C₈H₂₄HfN₄

[ Molecular Weight ]:
354.79300

[ Flash Point ]:
109 °F

[ Exact Mass ]:
356.14700

[ PSA ]:
12.96000

[ LogP ]:
0.04920

[ Appearance of Characters ]:
crystal | colorless to pale yellow

MSDS

Safety Information

[ Symbol ]:

GHS02, GHS05

[ Signal Word ]:
Danger

[ Hazard Statements ]:
H228-H261-H314

[ Supplemental HS ]:
Reacts violently with water.

[ Precautionary Statements ]:
P210-P231 + P232-P280-P305 + P351 + P338-P370 + P378-P402 + P404

[ Personal Protective Equipment ]:
Eyeshields;Faceshields;full-face particle respirator type N100 (US);Gloves;respirator cartridge type N100 (US);type P1 (EN143) respirator filter;type P3 (EN 143) respirator cartridges

[ Hazard Codes ]:
F: Flammable;C: Corrosive;

[ Risk Phrases ]:
R11

[ Safety Phrases ]:
6-26-36/37/39-43-45

[ RIDADR ]:
UN 3396 4

[ WGK Germany ]:
3

Articles

Appl. Phys. Lett. 91 , 193503, (2007)

Surface morphology and crystallinity control in the atomic layer deposition (ALD) of hafnium and zirconium oxide thin films Hausmann DM, Gordon RG

J. Cryst. Growth 249 , 251-261, (2003)

The Savannah ALD System - An Excellent Tool for Atomic Layer Deposition Monsma D, Becker J

Material Matters 1(3) , 5, (2006)