The silicon oxygen double-bonded intermediates: A new method for the formation of organosilanones

…, NV Yablokova, VA Yablokov, GA Razuvaev

Index: Tomadze, A. V.; Yablokova, N. V.; Yablokov, V. A.; Razuvaev, G. A. Journal of Organometallic Chemistry, 1981 , vol. 212, # 1 p. 43 - 50

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Citation Number: 12

Abstract

Abstract The kinetics and mechanism of thermal decomposition of R 1 R 2 (H) SiOOR 3 silylperoxides have been studied. It has been shown that peroxides generated diorganosilanones R 1 R 2 Si= O, with a high yield in the temperature range 130-180 C. A mechanism is suggested for the silanone formation. The interaction of si1anones with cyclosiloxanes, triethylsilane, α-methylstyrene has been investigated as well as the ...