Name | Ethyl O-mesitylsulfonylacetohydroxamate |
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Synonyms |
Ethyl O-mesitylsulfo
O-Mesitylsulfonylacetohydroxamic Acid Ethyl Ester O-(Mesitylsulfonyl)acetohydroxamsaeure-ethylester Ethanimidic acid, N-[[(2,4,6-trimethylphenyl)sulfonyl]oxy]-, ethyl ester Ehylo-(2-mesitylenesulfonyl)acet-hydroxamate Ethyl O-MesitylsulfonylacetohydroxaMate ethyl O-(2-mesitylsulfonyl)acethydroxamate Ethyl o-(mesitylsulfonyl)acetohydroximate ethyl O-methylsulphonylacetohydroxamate Ethyl N-(mesitylsulfonyl)oxyacetimidate ethyl O-(mesitylsulfonyl)acetohydroxamate ethyl O-(2-mesitylenesulfonyl)acethydroxamate Ethyl O-methylsulfonylacetohydroxamate. EINECS 253-825-5 Ethyl N-[(mesitylsulfonyl)oxy]ethanimidate ethyl O-mesitylenesulfonylacetohydroxamate MFCD00009244 ethyl O-(mesitylenesulfonyl)acetohydroximate O-Mesityl sulfonyl acetohydroxamic acid ethylester;98%, |
Density | 1.2±0.1 g/cm3 |
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Boiling Point | 381.7±52.0 °C at 760 mmHg |
Melting Point | 54-56 °C(lit.) |
Molecular Formula | C13H19NO4S |
Molecular Weight | 285.359 |
Flash Point | 184.7±30.7 °C |
Exact Mass | 285.103485 |
PSA | 73.34000 |
LogP | 4.00 |
Vapour Pressure | 0.0±0.8 mmHg at 25°C |
Index of Refraction | 1.516 |
Storage condition | 2-8°C |
Personal Protective Equipment | Eyeshields;Gloves;type N95 (US);type P1 (EN143) respirator filter |
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Hazard Codes | Xi |
Risk Phrases | R36/37/38:Irritating to eyes, respiratory system and skin . |
Safety Phrases | 24/25 |
RIDADR | NONH for all modes of transport |
WGK Germany | 3 |
HS Code | 2925290090 |
~89% 38202-27-6 |
Literature: BRISTOL-MYERS SQUIBB COMPANY; PRACITTO, Richard; KADOW, John, F.; BENDER, John, A.; BENO, Brett, R.; GRANT-YOUNG, Katharine; HAN, Ying; HEWAWASAM, Piyasena; NICKEL, Andrew; PARCELLA, Kyle, E.; YEUNG, Kap-Sun; CHUPAK, Louis, S. Patent: WO2011/112186 A1, 2011 ; Location in patent: Page/Page column 202 ; WO 2011/112186 A1 |
~94% 38202-27-6 |
Literature: BRISTOL-MYERS SQUIBB COMPANY; PRACITTO, Richard; KADOW, John F.; BENDER, John A.; BENO, Brett R.; GRANT-YOUNG, Katharine A.; HAN, Ying; HEWAWASAM, Piyasena; NICKEL, Andrew; PARCELLA, Kyle E.; YEUNG, Kap-Sun; CHUPAK, Louis S. Patent: WO2010/30538 A2, 2010 ; Location in patent: Page/Page column 203 ; |
Precursor 3 | |
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DownStream 2 | |
HS Code | 2925290090 |
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Summary | 2925290090 other imines and their derivatives; salts thereof。Supervision conditions:None。VAT:17.0%。Tax rebate rate:9.0%。MFN tariff:6.5%。General tariff:30.0% |