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38202-27-6

38202-27-6 structure
38202-27-6 structure

Name Ethyl O-mesitylsulfonylacetohydroxamate
Synonyms Ethyl O-mesitylsulfo
O-Mesitylsulfonylacetohydroxamic Acid Ethyl Ester
O-(Mesitylsulfonyl)acetohydroxamsaeure-ethylester
Ethanimidic acid, N-[[(2,4,6-trimethylphenyl)sulfonyl]oxy]-, ethyl ester
Ehylo-(2-mesitylenesulfonyl)acet-hydroxamate
Ethyl O-MesitylsulfonylacetohydroxaMate
ethyl O-(2-mesitylsulfonyl)acethydroxamate
Ethyl o-(mesitylsulfonyl)acetohydroximate
ethyl O-methylsulphonylacetohydroxamate
Ethyl N-(mesitylsulfonyl)oxyacetimidate
ethyl O-(mesitylsulfonyl)acetohydroxamate
ethyl O-(2-mesitylenesulfonyl)acethydroxamate
Ethyl O-methylsulfonylacetohydroxamate.
EINECS 253-825-5
Ethyl N-[(mesitylsulfonyl)oxy]ethanimidate
ethyl O-mesitylenesulfonylacetohydroxamate
MFCD00009244
ethyl O-(mesitylenesulfonyl)acetohydroximate
O-Mesityl sulfonyl acetohydroxamic acid ethylester;98%,
Density 1.2±0.1 g/cm3
Boiling Point 381.7±52.0 °C at 760 mmHg
Melting Point 54-56 °C(lit.)
Molecular Formula C13H19NO4S
Molecular Weight 285.359
Flash Point 184.7±30.7 °C
Exact Mass 285.103485
PSA 73.34000
LogP 4.00
Vapour Pressure 0.0±0.8 mmHg at 25°C
Index of Refraction 1.516
Storage condition 2-8°C
Personal Protective Equipment Eyeshields;Gloves;type N95 (US);type P1 (EN143) respirator filter
Hazard Codes Xi
Risk Phrases R36/37/38:Irritating to eyes, respiratory system and skin .
Safety Phrases 24/25
RIDADR NONH for all modes of transport
WGK Germany 3
HS Code 2925290090

~89%

38202-27-6 structure

38202-27-6

Literature: BRISTOL-MYERS SQUIBB COMPANY; PRACITTO, Richard; KADOW, John, F.; BENDER, John, A.; BENO, Brett, R.; GRANT-YOUNG, Katharine; HAN, Ying; HEWAWASAM, Piyasena; NICKEL, Andrew; PARCELLA, Kyle, E.; YEUNG, Kap-Sun; CHUPAK, Louis, S. Patent: WO2011/112186 A1, 2011 ; Location in patent: Page/Page column 202 ; WO 2011/112186 A1

~94%

38202-27-6 structure

38202-27-6

Literature: BRISTOL-MYERS SQUIBB COMPANY; PRACITTO, Richard; KADOW, John F.; BENDER, John A.; BENO, Brett R.; GRANT-YOUNG, Katharine A.; HAN, Ying; HEWAWASAM, Piyasena; NICKEL, Andrew; PARCELLA, Kyle E.; YEUNG, Kap-Sun; CHUPAK, Louis S. Patent: WO2010/30538 A2, 2010 ; Location in patent: Page/Page column 203 ;
HS Code 2925290090
Summary 2925290090 other imines and their derivatives; salts thereof。Supervision conditions:None。VAT:17.0%。Tax rebate rate:9.0%。MFN tariff:6.5%。General tariff:30.0%