硅
硅用途
2.主要用于半导体、合金、有机硅高分子材料。高纯的单晶硅是重要的半导体材料。用作二极管、三极管、晶闸管和各种集成电路材料。在开发能源方面也是一种很有前途的材料,可以制造太阳能电池等。将陶瓷和金属混合烧结,制成金属陶瓷复合材料,耐高温,富韧性,可以切割,集合了金属和陶瓷的优点,是金属陶瓷、宇宙航行的重要材料。用纯二氧化硅制得的高透明度的玻璃纤维,光纤通信容量高,且不受电、磁干扰,并具有高度的保密性,可用于光导纤维通信。硅有机化合物可作为塑料、涂料等,得到了广泛应用。
3.用于制造合金、有机硅化合物和四氯化硅等,是一种极重要的半导体材料。
硅名称
[ CAS 号 ]:
7440-21-3
[ 中文名 ]:
单质硅
[ 英文名 ]:
Silicon
[中文别名 ]:
[英文别名 ]:
- porous silicon
- silicon powder
- MFCD00085311
- Silicon
- EINECS 231-130-8
硅物理化学性质
[ 密度 ]:
2.33
[ 沸点 ]:
2355ºC
[ 熔点 ]:
1410ºC
[ 分子式 ]:
Si
[ 分子量 ]:
28.09000
[ 精确质量 ]:
27.98000
[ 外观性状 ]:
银色-灰色固体
[ 储存条件 ]:
Flammables area
[ 稳定性 ]:
Stable. Fine powder is highly flammable. Incompatible with oxidizing agents, bases, carbonates, alkali metals, lead and aluminium oxides, halogens, carbides, formic acid.
[ 水溶解性 ]:
INSOLUBLE
硅MSDS
硅毒性和生态
CHEMICAL IDENTIFICATION
- RTECS NUMBER :
- VW0400000
- CHEMICAL NAME :
- Silicon
- CAS REGISTRY NUMBER :
- 7440-21-3
- LAST UPDATED :
- 199712
- DATA ITEMS CITED :
- 31
- MOLECULAR FORMULA :
- Si
- MOLECULAR WEIGHT :
- 28.09
HEALTH HAZARD DATA
ACUTE TOXICITY DATA
- TYPE OF TEST :
- Standard Draize test
- ROUTE OF EXPOSURE :
- Administration into the eye
- SPECIES OBSERVED :
- Rodent - rabbit
- REFERENCE :
- FAONAU FAO Nutrition Meetings Report Series. (Rome, Italy) No.?-57, 1948-77. Discontinued. Volume(issue)/page/year: 53A,21,1974 ** ACUTE TOXICITY DATA **
- TYPE OF TEST :
- LD50 - Lethal dose, 50 percent kill
- ROUTE OF EXPOSURE :
- Oral
- SPECIES OBSERVED :
- Rodent - rat
- DOSE/DURATION :
- 3160 mg/kg
- TOXIC EFFECTS :
- Details of toxic effects not reported other than lethal dose value
- REFERENCE :
- FAONAU FAO Nutrition Meetings Report Series. (Rome, Italy) No.?-57, 1948-77. Discontinued. Volume(issue)/page/year: 53A,21,1974
- TYPE OF TEST :
- LDLo - Lowest published lethal dose
- ROUTE OF EXPOSURE :
- Intraperitoneal
- SPECIES OBSERVED :
- Rodent - rat
- DOSE/DURATION :
- 500 mg/kg
- REFERENCE :
- NTIS** National Technical Information Service. (Springfield, VA 22161) Formerly U.S. Clearinghouse for Scientific & Technical Information. Volume(issue)/page/year: OTS0536164 *** REVIEWS *** ACGIH TLV-TWA 10 mg/m3 DTLVS* The Threshold Limit Values (TLVs) and Biological Exposure Indices (BEIs) booklet issues by American Conference of Governmental Industrial Hygienists (ACGIH), Cincinnati, OH, 1996 Volume(issue)/page/year: TLV/BEI,1997 *** U.S. STANDARDS AND REGULATIONS *** MSHA STANDARD-air:TWA 10 mg/m3 DTLWS* "Documentation of the Threshold Limit Values for Substances in Workroom Air," Supplements. For publisher information, see 85INA8. Volume(issue)/page/year: 3,27,1973 OSHA PEL (Gen Indu):8H TWA 15 mg/m3, total dust CFRGBR Code of Federal Regulations. (U.S. Government Printing Office, Supt. of Documents, Washington, DC 20402) Volume(issue)/page/year: 29,1910.1000,1994 OSHA PEL (Gen Indu):8H TWA 5 mg/m3, respirable fraction CFRGBR Code of Federal Regulations. (U.S. Government Printing Office, Supt. of Documents, Washington, DC 20402) Volume(issue)/page/year: 29,1910.1000,1994 OSHA PEL (Construc):8H TWA 15 mg/m3, total dust CFRGBR Code of Federal Regulations. (U.S. Government Printing Office, Supt. of Documents, Washington, DC 20402) Volume(issue)/page/year: 29,1926.55,1994 OSHA PEL (Construc):8H TWA 5 mg/m3, respirable fraction CFRGBR Code of Federal Regulations. (U.S. Government Printing Office, Supt. of Documents, Washington, DC 20402) Volume(issue)/page/year: 29,1926.55,1994 OSHA PEL (Shipyard):8H TWA 15 mg/m3, total dust CFRGBR Code of Federal Regulations. (U.S. Government Printing Office, Supt. of Documents, Washington, DC 20402) Volume(issue)/page/year: 29,1915.1000,1993 OSHA PEL (Shipyard):8H TWA 5 mg/m3, respirable fraction CFRGBR Code of Federal Regulations. (U.S. Government Printing Office, Supt. of Documents, Washington, DC 20402) Volume(issue)/page/year: 29,1915.1000,1993 *** OCCUPATIONAL EXPOSURE LIMITS *** OEL-AUSTRALIA:TWA 10 mg/m3 JAN 1993 OEL-BELGIUM:TWA 10 mg/m3 JAN 1993 OEL-DENMARK:TWA 10 mg/m3 JAN 1993 OEL-FRANCE:TWA 10 mg/m3 JAN 1993 OEL-THE NETHERLANDS:TWA 10 mg/m3 JAN 1993 OEL-SWITZERLAND:TWA 4 mg/m3 JAN 1993 OEL-UNITED KINGDOM:TWA 10 mg/m3 (total dust) JAN 1993 OEL-UNITED KINGDOM:TWA 5 mg/m3 (resp. dust) JAN 1993 OEL IN BULGARIA, COLOMBIA, JORDAN, KOREA check ACGIH TLV OEL IN NEW ZEALAND, SINGAPORE, VIETNAM check ACGIH TLV *** NIOSH STANDARDS DEVELOPMENT AND SURVEILLANCE DATA *** NIOSH RECOMMENDED EXPOSURE LEVEL (REL) : NIOSH REL TO SILICON, respirable fraction-air:10H TWA 5 mg/m3 REFERENCE : NIOSH* National Institute for Occupational Safety and Health, U.S. Dept. of Health, Education, and Welfare, Reports and Memoranda. Volume(issue)/page/year: DHHS #92-100,1992 NIOSH RECOMMENDED EXPOSURE LEVEL (REL) : NIOSH REL TO SILICON, total dust-air:10H TWA 10 mg/m3 REFERENCE : NIOSH* National Institute for Occupational Safety and Health, U.S. Dept. of Health, Education, and Welfare, Reports and Memoranda. Volume(issue)/page/year: DHHS #92-100,1992 NIOSH OCCUPATIONAL EXPOSURE SURVEY DATA : NOHS - National Occupational Hazard Survey (1974) NOHS Hazard Code - 68695 No. of Facilities: 3856 (estimated) No. of Industries: 48 No. of Occupations: 66 No. of Employees: 99138 (estimated) NOES - National Occupational Exposure Survey (1983) NOES Hazard Code - X4229 No. of Facilities: 12 (estimated) No. of Industries: 1 No. of Occupations: 5 No. of Employees: 1740 (estimated) No. of Female Employees: 503 (estimated) NOES - National Occupational Exposure Survey (1983) NOES Hazard Code - X4230 No. of Facilities: 118 (estimated) No. of Industries: 6 No. of Occupations: 6 No. of Employees: 1962 (estimated) No. of Female Employees: 112 (estimated) NOES - National Occupational Exposure Survey (1983) NOES Hazard Code - X6495 No. of Facilities: 19 (estimated) No. of Industries: 1 No. of Occupations: 2 No. of Employees: 2379 (estimated) NOES - National Occupational Exposure Survey (1983) NOES Hazard Code - 68695 No. of Facilities: 59062 (estimated) No. of Industries: 296 No. of Occupations: 129 No. of Employees: 693583 (estimated) No. of Female Employees: 28164 (estimated)
硅安全信息
[ 符号 ]:
GHS02
[ 信号词 ]:
Warning
[ 危害声明 ]:
H228
[ 警示性声明 ]:
P210
[ 个人防护装备 ]:
Eyeshields;Gloves;type N95 (US);type P1 (EN143) respirator filter
[ 危害码 (欧洲) ]:
F:Flammable
[ 风险声明 (欧洲) ]:
R11
[ 安全声明 (欧洲) ]:
S16-S33-S7/9
[ 危险品运输编码 ]:
UN 2922 8/PG 2
[ WGK德国 ]:
2
[ RTECS号 ]:
VW0400000
[ 包装等级 ]:
III
[ 危险类别 ]:
4.1
[ 海关编码 ]:
2804690000
硅合成路线
硅上下游产品
硅上游产品
硅下游产品
硅制备
1.三氯氢硅法:将干燥的硅粉加入合成炉中,与通入的干燥氯化氢气体在280~330℃有氯化亚铜催化剂存在下进行氯化反应,反应气体经旋风分离除去杂质,再用氯化钙冷冻盐水将气态三氯氢硅冷凝成液体,经粗馏塔蒸馏和冷凝,除去高沸物和低沸物,再经精馏塔蒸馏和冷凝,得到精制三氯氢硅液体。纯度达到7个“9”以上、杂质含量小于1×10-7,硼要求在0.5×10-9以下。提纯后的三氯氢硅送入不锈钢制的还原炉内,用超纯氢气作还原剂,在1050~1100℃还原成硅,并以硅芯棒为载体,沉积而得多晶硅成品。其反应式如下:
图XIV-6 硅的制取装置
2.用SiO2含量大约为95%的硅石和灰分少的焦炭混合,加热到1900℃左右进行还原。此方法制得的硅纯度为97%~98%,被称作金属硅。再将金属硅融化后进行重结晶,用酸除去杂质,得到纯度为99.7%~99.8%的金属硅。如要将它做成半导体用硅,还要将其转化成易于提纯的液体或气体形式,再经蒸馏、分解过程得到多晶硅。如需得到高纯度的硅,则需要进行进一步的提纯处理。
3.用SiO2含量大约为95%的硅石和灰分少的焦炭混合,用1000~3000kVA开式电弧炉,加热到1900℃左右进行还原。
硅海关
[ 海关编码 ]: 2804690000
硅文献
Nature 518(7537) , 80-4, (2015)
Heteroaromatic compounds containing carbon-silicon (C-Si) bonds are of great interest in the fields of organic electronics and photonics, drug discovery, nuclear medicine and complex molecule synthesi...
A 5-day method for determination of soluble silicon concentrations in nonliquid fertilizer materials using a sodium carbonate-ammonium nitrate extractant followed by visible spectroscopy with heteropoly blue analysis: single-laboratory validation.J. AOAC Int. 96(2) , 251-9, (2013)
A 5-day method for determining the soluble silicon (Si) concentrations in nonliquid fertilizer products was developed using a sodium carbonate (Na2CO3)-ammonium nitrate (NH4NO3) extractant followed by...
Diagnostic use of cerebral and extracerebral oxysterols.Clin. Chem. Lab Med. 42(2) , 186-91, (2004)
24S-Hydroxycholesterol (24OHC) and 27-hydroxycholesterol (27OHC) are two structurally similar oxysterols of different origins--the former almost exclusively formed in the brain and the latter formed t...
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硅相关知识
2022-05-03 17:51:01
本文详细介绍了硅: 概述/性子 极其常见的一种元素,在自然界以繁杂的硅酸盐或二氧化硅的方式,普遍存在于岩石、砂砾、灰尘当中。其在地壳中是第二充裕的元素,组成地壳总质量的26.4%,仅次于第一位的氧(49.4%)[1]。硅粉,没有固定形态,呈深棕色粉末。 不溶于水,密度比水大。 遇热或明火轻易...
相关化合物
【硅】化源网提供硅CAS号7440-21-3,硅MSDS及其说明、性质、英文名、生产厂家、作用/用途、分子量、密度、沸点、熔点、结构式等。CAS号查询硅上化源网,专业又轻松。>>电脑版:硅
标题:硅_MSDS_用途_密度_硅CAS号【7440-21-3】_化源网 地址:https://m.chemsrc.com/mip/cas/7440-21-3_1041829.html